Residue remover and photoresist stripper, ALEG™-380, J.T.Baker®供应商: Avantor®
BAKR6482-05EA 690 CNYBAKR6482-05 BAKR6485-07
Residue remover and photoresist stripper, ALEG™-380, J.T.Baker®
Residue remover is designed to provide protection against galvanic corrosion associated with device architecture containing complicated metal stacks. Used in high manufacturing applications such as post ash, bond pad, lines and spaces residue removal, bulk photoresist stripper and bi-layer resist strip.
- 100% water soluble formulation - no intermediate solvent rinse required
- Does not contain fluoride and hydroxylamine
- Aluminum, tungsten and titanium compatible